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dc.contributor.authorChen, Charlie Chung-Pingen_US
dc.contributor.authorChang, Y. Austinen_US
dc.contributor.authorKuech, Thomas F.en_US
dc.date.accessioned2007-07-13T19:24:33Z
dc.date.available2007-07-13T19:24:33Z
dc.date.issued1995en_US
dc.identifier.citationThe following article appeared in Chen, C.-P., Chang, Y.A., & Kuech, T.F. (1995). Schottky Barrier Enhancement Using Reacted Ni2 Al3/Ni/N Ga As, Ni/Al/Ni/N Ga As, And Ni Al/Al/Ni/N Ga As Contacts. Journal Of Applied Physics, 77(9), 4777-82. and may be found at http://link.aip.org/link/?jap/77/4777en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/9948
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent801196 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://jap.aip.orgen_US
dc.rightsCopyright 1995 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleSchottky barrier enhancement using reacted Ni2Al3/Ni/n-GaAs, Ni/Al/Ni/n-GaAs, and NiAl/Al/Ni/n-GaAs contactsen_US
dc.typeArticle
dc.identifier.doihttp://dx.doi.org/10.1063/1.359397en_US


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