Show simple item record

dc.contributor.authorNakano, Aiichiroen_US
dc.contributor.authorVashishta, Priyaen_US
dc.contributor.authorSzlufarska, Izabelaen_US
dc.contributor.authorKalia, Rajiv K.en_US
dc.date.accessioned2007-07-13T19:23:43Z
dc.date.available2007-07-13T19:23:43Z
dc.date.issued2005en_US
dc.identifier.citationThe following article appeared in Szlufarska, I., Kalia, R.K., Nakano, A., & Vashishta, P. (2005). Atomistic Processes During Nanoindentation Of Amorphous Silicon Carbide. Applied Physics Letters, 86(2), -021915. and may be found at http://link.aip.org/link/?apl/86/en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/9836
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent627432 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdfen_US
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleAtomistic processes during nanoindentation of amorphous silicon carbideen_US


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record