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dc.contributor.authorSpeth, Robert R.en_US
dc.contributor.authorEmmert, Gilbert A.en_US
dc.contributor.authorGoeckner, Matthew J.en_US
dc.date.accessioned2007-07-13T19:20:54Z
dc.date.available2007-07-13T19:20:54Z
dc.date.issued1994en_US
dc.identifier.citationThe following article appeared in Speth, R.R., Emmert, G.A., & Goeckner, M.J. (1994). Influence Of The High Voltage Pulse Shape On The Plasma Source Ion Implantation Process. Applied Physics Letters, 65(18), 2272-2274. and may be found at http://link.aip.org/link/?apl/65/2272en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/9464
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent71724 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 1994 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleInfluence of the High-Voltage Pulse-Shape on the Plasma Source Ion-Implantation Processen_US


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