Influence of the High-Voltage Pulse-Shape on the Plasma Source Ion-Implantation Process
Speth, Robert R.
Emmert, Gilbert A.
Goeckner, Matthew J.
American Institute of Physics
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The following article appeared in Speth, R.R., Emmert, G.A., & Goeckner, M.J. (1994). Influence Of The High Voltage Pulse Shape On The Plasma Source Ion Implantation Process. Applied Physics Letters, 65(18), 2272-2274. and may be found at http://link.aip.org/link/?apl/65/2272