Use of photosensitive polyimide for deep x-ray lithography
Denton, Denice D.
American Inst of Physics, Woodbury, NY, USA
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The following article appeared in White, V., Ghodssi, R., Herdey, C., Denton, D.D., & McCaughan, L. (1995). Use Of Photosensitive Polyimide For Deep X Ray Lithography. Applied Physics Letters, 66(16), 2072-2073. and may be found at http://link.aip.org/link/?apl/66/2072