Use of photosensitive polyimide for deep x-ray lithography

File(s)
Date
1995Author
White, Victor
Ghodssi, Reza
Herdey, Cheryl
Denton, Denice D.
McCaughan, Leon
Publisher
American Inst of Physics, Woodbury, NY, USA
Metadata
Show full item recordPermanent Link
http://digital.library.wisc.edu/1793/9242Description
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
Citation
The following article appeared in White, V., Ghodssi, R., Herdey, C., Denton, D.D., & McCaughan, L. (1995). Use Of Photosensitive Polyimide For Deep X Ray Lithography. Applied Physics Letters, 66(16), 2072-2073. and may be found at http://link.aip.org/link/?apl/66/2072