Mechanical stability of ultrathin Ge/Si film on SiO2: The effect of Si/SiO2 interface

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Date
2005Author
Huang, Minghuang
Nairn, John A.
Liu, Feng
Lagally, Max G.
Publisher
American Institute of Physics
Metadata
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http://digital.library.wisc.edu/1793/9142Description
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Citation
The following article appeared in Huang, M.H., Nairn, J.A., Liu, F., & Lagally, M.G. (2005). Mechanical Stability Of Ultrathin Ge/Si Film On Si O2: The Effect Of Si/Si O2 Interface. Journal Of Applied Physics, 97(11), -116108. and may be found at http://link.aip.org/link/?jap/97/