Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography
Solak, Harun H.
Nealey, Paul F.
American Institute of Physics Inc
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The following article appeared in Solak, H.H., He, D., Li, W.S.G.S., Cerrina, F., Sohn, B.H., et al. (1999). Exposure Of 38 Nm Period Grating Patterns With Extreme Ultraviolet Interferometric Lithography. Applied Physics Letters, 75(15), 2328-2330. and may be found at http://link.aip.org/link/?apl/75/2328