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    Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography

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    Date
    1999
    Author
    Solak, Harun H.
    He, Dongxing
    Li, Weimin
    Singh-Gasson, Sangeet
    Cerrina, Francesco
    Sohn, Byeong-Hyeok
    Yang, Xiaomin
    Nealey, Paul F.
    Publisher
    American Institute of Physics Inc
    Metadata
    Show full item record
    Permanent Link
    http://digital.library.wisc.edu/1793/9086
    Related Material/Data
    http://www.aip.org
    http://apl.aip.org/
    DOI
    http://dx.doi.org/10.1063/1.125005
    Description
    This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
    Citation
    The following article appeared in Solak, H.H., He, D., Li, W.S.G.S., Cerrina, F., Sohn, B.H., et al. (1999). Exposure Of 38 Nm Period Grating Patterns With Extreme Ultraviolet Interferometric Lithography. Applied Physics Letters, 75(15), 2328-2330. and may be found at http://link.aip.org/link/?apl/75/2328
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    • College of Engineering Publications

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