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dc.contributor.authorKnaack, Sara A.en_US
dc.contributor.authorEddington, Janiceen_US
dc.contributor.authorLeonard, Quinnen_US
dc.contributor.authorCerrina, Francescoen_US
dc.contributor.authorOnellion, Marshallen_US
dc.date.accessioned2007-07-13T19:17:57Z
dc.date.available2007-07-13T19:17:57Z
dc.date.issued2004en_US
dc.identifier.citationThe following article appeared in Knaack, S.A., Eddington, J., Leonard, Q., Cerrina, F., & Onellion, M. (2004). Dense Arrays Of Nanopores As X Ray Lithography Masks. Applied Physics Letters, 84(17), 3388-90. and may be found at http://link.aip.org/link/?apl/84/3388en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/9074
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent345687 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 2004 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleDense arrays of nanopores as x-ray lithography masksen_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.1705724en_US


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