Thermally stable, oxidation resistant capping technology for Ti/Al ohmic contacts to n-GaN
Pelto, Christopher M.
Chang, Y. Austin
Williams, R. Stanley
American Institute of Physics
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The following article appeared in Pelto, C.M., Chang, Y.A., Yong Chen, & Williams, R.S. (2002). Thermally Stable, Oxidation Resistant Capping Technology For Ti/Al Ohmic Contacts To N Ga N. Journal Of Applied Physics, 92(8), 4283-9. and may be found at http://link.aip.org/link/?jap/92/4283