Thermally stable, oxidation resistant capping technology for Ti/Al ohmic contacts to n-GaN

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Author(s): Pelto, Christopher M.; Chang, Y. Austin; Chen, Yong; Williams, R. Stanley
Publisher: American Institute of Physics
Citation: The following article appeared in Pelto, C.M., Chang, Y.A., Yong Chen, & Williams, R.S. (2002). Thermally Stable, Oxidation Resistant Capping Technology For Ti/Al Ohmic Contacts To N Ga N. Journal Of Applied Physics, 92(8), 4283-9. and may be found at http://link.aip.org/link/?jap/92/4283
Date: 2002
Part of: http://www.aip.org; http://jap.aip.org
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Permanent link: http://digital.library.wisc.edu/1793/8944
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