Enhanced surface diffusion through termination conversion during epitaxial SrRuO3 growth
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- Author(s)
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Rijnders, Guus; Blank, Dave H.A.; Choi, Junghoon; Eom, Chang-Beom
- Publisher
- American Institute of Physics
- Citation
- The following article appeared in Rijnders, G., Blank, D.H.A., Choi, J., & Eom, C.B. (2004). Enhanced Surface Diffusion Through Termination Conversion During Epitaxial Sr Ru O3 Growth. Applied Physics Letters, 84(4), 505-507. and may be found at http://link.aip.org/link/?apl/84/505
- Date
- 2004
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- http://www.aip.org; http://apl.aip.org/
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- This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
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http://digital.library.wisc.edu/1793/8884
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