Does high density-low pressure etching depend on the type of plasma source?
Breun, Robert A.
Quick, Anthony K.
Chen, Robert Tseng Shiung
American Institute of Physics
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The following article appeared in Hershkowitz, N., Ding, J., Breun, R.A., Chen, R.T.S., Meyer, J., & Quick, A.K. (1996). Does high density-low pressure etching depend on the type of plasma source?. In 37th Annual Meeting of the Division of Plasma Physics of the American Physical Society, 6-10 Nov. 1995, 3 (5), 2197-202. and may be found at http://link.aip.org/link/?php/3/2197