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    Role of plasma-aided manufacturing in semiconductor fabrication

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    Date
    1998
    Author
    Hershkowitz, Noah
    Publisher
    IEEE, Piscataway, NJ, USA
    Metadata
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    Permanent Link
    http://digital.library.wisc.edu/1793/8692
    Related Material/Data
    http://www.ieee.org/
    http://ieeexplore.ieee.org/servlet/opac?punumber=27
    DOI
    http://dx.doi.org/10.1109/27.747878
    Description
    This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
    Citation
    Hershkowitz, N. (1998). Role Of Plasma Aided Manufacturing In Semiconductor Fabrication. Ieee Transactions On Plasma Science, 26(6), 1610-1620.
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    • College of Engineering Publications

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