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dc.contributor.authorVadali, Madhu
dc.contributor.authorMa, Chao
dc.contributor.authorLi, Xiaochun
dc.contributor.authorDuffie, Neil A.
dc.contributor.authorPfefferkorn, Frank E.
dc.date.accessioned2013-04-04T15:23:09Z
dc.date.available2013-04-04T15:23:09Z
dc.date.issued2013-03-25
dc.identifier.citationICOMM 2013 No. 33en
dc.identifier.urihttp://digital.library.wisc.edu/1793/65304
dc.description.abstractThe objective of this work is to generate irregular, smooth, adaptive laser scan trajectories for pulsed laser micro polishing (PL?P). Traditionally PL?P, like other surface finishing processes has used zigzag scan paths. Zigzag trajectories are simple in nature, are comprised of sharp turns, the dynamics of the positioning system are not taken into account, and more importantly are not adaptable because the path generation is independent of surface condition. In this paper, the authors present a scan trajectory generation scheme that can overcome these limitations. These trajectories are based on the artificial potential fields method of path planning that take the surface condition into account. Computer simulations are presented to illustrate the characteristics of the path and guidelines are developed for choosing the trajectory generation parameters. Finally, smooth, irregular scan trajectories are generated for a micro end milled Ti6Al4V surface that has a feature that needs no polishing, thus illustrating the versatility of the trajectory generations scheme.en
dc.publisher8th International Conference on MicroManufacturing (ICOMM 2013)
dc.subjectMicroen
dc.subjectLaseren
dc.subjectPulse Laseren
dc.subjectPolishingen
dc.subjectPath Planningen
dc.titleIrregular, Adaptive Scan Trajectories for Pulsed Laser Micro Polishingen
dc.typeConference Paperen


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