Magnetic-field-enhanced rf argon plasma for ionized sputtering of copper
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Date
1997Author
Wang, Weitung
Foster, John
Wendt, Amy E.
Booske, John H.
Onuoha, Tina
Sandstrom, Perry W.
Liu, Henley L.
Gearhart, Steven S.
Hershkowitz, Noah
Publisher
American Institute of Physics
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http://digital.library.wisc.edu/1793/10944Description
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Citation
The following article appeared in Wang, W., Foster, J., Wendt, A.E., Booske, J.H., Onuoha, T., Sandstrom, P.W., et al. (1997). Magnetic Field Enhanced Rf Argon Plasma For Ionized Sputtering Of Copper. Applied Physics Letters, 71(12), 1622-1624. and may be found at http://link.aip.org/link/?apl/71/1622