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dc.contributor.authorMeyer, J.A.en_US
dc.contributor.authorMau, Roberten_US
dc.contributor.authorWendt, Amy E.en_US
dc.date.accessioned2007-07-13T19:32:03Z
dc.date.available2007-07-13T19:32:03Z
dc.date.issued1996en_US
dc.identifier.citationThe following article appeared in Meyer, J.A., Mau, R., & Wendt, A.E. (1996). Plasma Properties Determined With Induction Loop Probes In A Planar Inductively Coupled Plasma Source. Journal Of Applied Physics, 79(3), 1298-302. and may be found at http://link.aip.org/link/?jap/79/1298en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/10940
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent154682 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://jap.aip.orgen_US
dc.rightsCopyright 1996 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titlePlasma properties determined with induction loop probes in a planar inductively coupled plasma sourceen_US
dc.typeArticle
dc.identifier.doihttp://dx.doi.org/10.1063/1.361025en_US


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