Control of ion energy distribution at substrates during plasma processing
Wendt, Amy E.
American Institute of Physics
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The following article appeared in Wang, S.-B., & Wendt, A.E. (2000). Control Of Ion Energy Distribution At Substrates During Plasma Processing. Journal Of Applied Physics, 88(2), 643-6. and may be found at http://link.aip.org/link/?jap/88/643