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dc.contributor.authorWang, Qiangen_US
dc.contributor.authorNath, Shyamal K.en_US
dc.contributor.authorGraham, Michael D.en_US
dc.contributor.authorNealey, Paul F.en_US
dc.contributor.authorde Pablo, Juan Joséen_US
dc.date.accessioned2007-07-13T19:30:04Z
dc.date.available2007-07-13T19:30:04Z
dc.date.issued2000en_US
dc.identifier.citationThe following article appeared in Wang, Q., Nath, S. K., Graham, M. D., Nealey, P. F., & de Pablo, J. J. (2000). Symmetric Diblock Copolymer Thin Films Confined Between Homogeneous And Patterned Surfaces: Simulations And Theory. Journal Of Chemical Physics, 112(22), 9996-10010. and may be found at http://link.aip.org/link/?jcp/112/9996en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/10676
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent478955 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.publisherAmerican Institute of Physics Inc., Woodbury, NY, USAen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://jcp.aip.orgen_US
dc.rightsCopyright 2000 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleSymmetric diblock copolymer thin films confined between homogeneous and patterned surfaces: Simulations and theoryen_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.481635en_US


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