Symmetric diblock copolymer thin films confined between homogeneous and patterned surfaces: Simulations and theory
Nath, Shyamal K.
Graham, Michael D.
Nealey, Paul F.
de Pablo, Juan José
American Institute of Physics Inc., Woodbury, NY, USA
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The following article appeared in Wang, Q., Nath, S. K., Graham, M. D., Nealey, P. F., & de Pablo, J. J. (2000). Symmetric Diblock Copolymer Thin Films Confined Between Homogeneous And Patterned Surfaces: Simulations And Theory. Journal Of Chemical Physics, 112(22), 9996-10010. and may be found at http://link.aip.org/link/?jcp/112/9996