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dc.contributor.authorTate, Ranjeet S.en_US
dc.contributor.authorFryer, David S.en_US
dc.contributor.authorPasqualini, Silviaen_US
dc.contributor.authorMontague, Martha F.en_US
dc.contributor.authorde Pablo, Juan Joséen_US
dc.contributor.authorNealey, Paul F.en_US
dc.date.accessioned2007-07-13T19:30:02Z
dc.date.available2007-07-13T19:30:02Z
dc.date.issued2001en_US
dc.identifier.citationThe following article appeared in Tate, R.S., Fryer, D.S., Paqualini, S., Montague, M.F., De Pablo, J.J., & Nealey, P.F. (2001). Extraordinary Elevation Of The Glass Transition Temperature Of Thin Polymer Films Grafted To Silicon Oxide Substrates. Journal Of Chemical Physics, 115(21), 9982-9990. and may be found at http://link.aip.org/link/?jcp/115/9982en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/10672
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent180069 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.publisherAmerican Institute of Physics Incen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://jcp.aip.orgen_US
dc.rightsCopyright 2001 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleExtraordinary elevation of the glass transition temperature of thin polymer films grafted to silicon oxide substratesen_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.1415497en_US


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