Show simple item record

dc.contributor.authorYoshimoto, Kenjien_US
dc.contributor.authorStoykovich, Mark P.en_US
dc.contributor.authorCao, Hongboen_US
dc.contributor.authorde Pablo, Juan Joséen_US
dc.contributor.authorNealey, Paul F.en_US
dc.contributor.authorDrugan, Walter J.en_US
dc.date.accessioned2007-07-13T19:29:58Z
dc.date.available2007-07-13T19:29:58Z
dc.date.issued2004en_US
dc.identifier.citationThe following article appeared in Yoshimoto, K., Stoykovich, M.P., Cao, H.B., De Pablo, J.J., Nealey, P.F., & Drugan, W.J. (2004). A Two Dimensional Model Of The Deformation Of Photoresist Structures Using Elastoplastic Polymer Properties. Journal Of Applied Physics, 96(4), 1857-1865. and may be found at http://link.aip.org/link/?jap/96/1857en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/10662
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent472710 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.publisherAmerican Institute of Physics Inc., Melville, United Statesen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://jap.aip.orgen_US
dc.rightsCopyright 2004 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleA two-dimensional model of the deformation of photoresist structures using elastoplastic polymer propertiesen_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.1768614en_US


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record