A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties
Stoykovich, Mark P.
de Pablo, Juan José
Nealey, Paul F.
Drugan, Walter J.
American Institute of Physics Inc., Melville, United States
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The following article appeared in Yoshimoto, K., Stoykovich, M.P., Cao, H.B., De Pablo, J.J., Nealey, P.F., & Drugan, W.J. (2004). A Two Dimensional Model Of The Deformation Of Photoresist Structures Using Elastoplastic Polymer Properties. Journal Of Applied Physics, 96(4), 1857-1865. and may be found at http://link.aip.org/link/?jap/96/1857