Application of wavelet spectral analysis to plasma fluctuation measurements using beam emission spectroscopy
Fonck, Raymond J.
McKee, George R.
American Institute of Physics Inc., Woodbury, NY, USA
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The following article appeared in Jakubowski, M., Fonck, R., Kim, J.S., & McKee, G. (1999). Application Of Wavelet Spectral Analysis To Plasma Fluctuation Measurements Using Beam Emission Spectroscopy. Review Of Scientific Instruments, 70(1 pt 2), 874-877. and may be found at http://link.aip.org/link/?rsi/70/874