PdAl Schottky contact to In0.52Al0.48As grown by metalorganic chemical vapor deposition
Chang, Y. Austin
Kuech, Thomas F.
American Institute of Physics
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The following article appeared in Lin, C.-F., Chang, Y.A., Pan, N., Huang, J.-W., & Kuech, T.F. (1995). Pd Al Schottky Contact To In0.52 Al0.48 As Grown By Metalorganic Chemical Vapor Deposition. Applied Physics Letters, 67(24), 3587-9. and may be found at http://link.aip.org/link/?apl/67/3587