Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing
Friedmann, James B.
Shohet, J. Leon
McVittie, James P.
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
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Friedmann, J.B., Shohet, J.L., Mau, R., Hershkowitz, N., Bisgaard, S., Ma, S.M., et al. (1997). Plasma Parameter Dependence Of Thin Oxide Damage From Wafer Charging During Electron Cyclotron Resonance Plasma Processing. Ieee Transactions On Semiconductor Manufacturing, 10(1), 154-166.