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dc.contributor.authorCismaru, Cristianen_US
dc.contributor.authorShohet, J. Leonen_US
dc.contributor.authorNauka, Krysztofen_US
dc.contributor.authorFriedmann, James B.en_US
dc.date.accessioned2007-07-13T19:27:51Z
dc.date.available2007-07-13T19:27:51Z
dc.date.issued1998en_US
dc.identifier.citationThe following article appeared in Cismaru, C., Shohet, J.L., Nauka, K., & Friedmann, J.B. (1998). Relationship Between The Charging Damage Of Test Structures And The Deposited Charge On Unpatterned Wafers Exposed To An Electron Cyclotron Resonance Plasma. Applied Physics Letters, 72(10), 1143-5. and may be found at http://link.aip.org/link/?apl/72/1143en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/10384
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent149456 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 1998 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleRelationship between the charging damage of test structures and the deposited charge on unpatterned wafers exposed to an electron cyclotron resonance plasmaen_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.120996en_US


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