Relationship between the charging damage of test structures and the deposited charge on unpatterned wafers exposed to an electron cyclotron resonance plasma
Shohet, J. Leon
Friedmann, James B.
American Institute of Physics
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The following article appeared in Cismaru, C., Shohet, J.L., Nauka, K., & Friedmann, J.B. (1998). Relationship Between The Charging Damage Of Test Structures And The Deposited Charge On Unpatterned Wafers Exposed To An Electron Cyclotron Resonance Plasma. Applied Physics Letters, 72(10), 1143-5. and may be found at http://link.aip.org/link/?apl/72/1143