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Relationship between the charging damage of test structures and the deposited charge on unpatterned wafers exposed to an electron cyclotron resonance plasma

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Author(s)
Cismaru, Cristian; Shohet, J. Leon; Nauka, Krysztof; Friedmann, James B.
Publisher
American Institute of Physics
Citation
The following article appeared in Cismaru, C., Shohet, J.L., Nauka, K., & Friedmann, J.B. (1998). Relationship Between The Charging Damage Of Test Structures And The Deposited Charge On Unpatterned Wafers Exposed To An Electron Cyclotron Resonance Plasma. Applied Physics Letters, 72(10), 1143-5. and may be found at http://link.aip.org/link/?apl/72/1143
Date
1998
Part of
http://www.aip.org; http://apl.aip.org/
Description
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
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http://digital.library.wisc.edu/1793/10384 
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