Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher
Shohet, J. Leon
American Institute of Physics Inc
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The following article appeared in Cismaru, C., & Shohet, J.L. (1999). Plasma Vacuum Ultraviolet Emission In An Electron Cyclotron Resonance Etcher. Applied Physics Letters, 74(18), 2599-2601. and may be found at http://link.aip.org/link/?apl/74/2599