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dc.contributor.authorCismaru, Cristianen_US
dc.contributor.authorShohet, J. Leonen_US
dc.contributor.authorLauer, Jason L.en_US
dc.contributor.authorHansen, Roger W.en_US
dc.contributor.authorOstapenko, Sergueien_US
dc.date.accessioned2007-07-13T19:27:48Z
dc.date.available2007-07-13T19:27:48Z
dc.date.issued2000en_US
dc.identifier.citationThe following article appeared in Cismaru, C., Shohet, J.L., Lauer, J.L., Hansen, R.W., & Ostapenko, S. (2000). Depletion Of Charge Produced During Plasma Exposure In Aluminum Oxide By Vacuum Ultraviolet Radiation. Applied Physics Letters, 77(24), 3914-16. and may be found at http://link.aip.org/link/?apl/77/3914en_US
dc.identifier.urihttp://digital.library.wisc.edu/1793/10376
dc.descriptionThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.en_US
dc.format.extent130675 bytes
dc.format.mimetypeapplication/pdfen_US
dc.format.mimetypeapplication/pdf
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofhttp://www.aip.orgen_US
dc.relation.ispartofhttp://apl.aip.org/en_US
dc.rightsCopyright 2000 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.en_US
dc.titleDepletion of charge produced during plasma exposure in aluminum oxide by vacuum ultraviolet radiationen_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.1331081en_US


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