In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation
Shohet, J. Leon
American Institute of Physics
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The following article appeared in Cismaru, C., & Shohet, J.L. (2000). In Situ Electrical Characterization Of Dielectric Thin Films Directly Exposed To Plasma Vacuum Ultraviolet Radiation. Journal Of Applied Physics, 88(4), 1742-6. and may be found at http://link.aip.org/link/?jap/88/1742