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Surface potential measurements of vacuum ultraviolet irradiated Al2O3, Si3N4, and SiO2

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Author(s)
Lauer, Jason L.; Shohet, J. Leon
Publisher
Institute of Electrical and Electronics Engineers Inc., Piscataway, NJ 08855-1331, United States
Citation
Lauer, J.L., & Shohet, J.L. (2005). Surface Potential Measurements Of Vacuum Ultraviolet Irradiated Al2 O3, Si3 N4, And Si O2. Ieee Transactions On Plasma Science, 33(2 I), 248-249.
Date
2005
Part of
http://www.ieee.org/; http://ieeexplore.ieee.org/servlet/opac?punumber=27
Description
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
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http://digital.library.wisc.edu/1793/10360 
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