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Use of photosensitive polyimide for deep x-ray lithography

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Author(s)
White, Victor; Ghodssi, Reza; Herdey, Cheryl; Denton, Denice D.; McCaughan, Leon
Publisher
American Inst of Physics, Woodbury, NY, USA
Citation
The following article appeared in White, V., Ghodssi, R., Herdey, C., Denton, D.D., & McCaughan, L. (1995). Use Of Photosensitive Polyimide For Deep X Ray Lithography. Applied Physics Letters, 66(16), 2072-2073. and may be found at http://link.aip.org/link/?apl/66/2072
Date
1995
Part of
http://www.aip.org; http://apl.aip.org/
Description
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
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http://digital.library.wisc.edu/1793/9242 
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