Mechanical stability of ultrathin Ge/Si film on SiO2: The effect of Si/SiO2 interface

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Author(s): Huang, Minghuang; Nairn, John A.; Liu, Feng; Lagally, Max G.
Publisher: American Institute of Physics
Citation: The following article appeared in Huang, M.H., Nairn, J.A., Liu, F., & Lagally, M.G. (2005). Mechanical Stability Of Ultrathin Ge/Si Film On Si O2: The Effect Of Si/Si O2 Interface. Journal Of Applied Physics, 97(11), -116108. and may be found at http://link.aip.org/link/?jap/97/
Date: 2005
Part of: http://www.aip.org; http://jap.aip.org
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Permanent link: http://digital.library.wisc.edu/1793/9142
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