About This Item

Ask the MINDS@UW Librarian

Does high density-low pressure etching depend on the type of plasma source?

Show full item record

File(s):

Author(s)
Breun, Robert A.; Quick, Anthony K.; Meyer, John; Chen, Robert Tseng Shiung; Hershkowitz, Noah; Ding, Ji
Publisher
American Institute of Physics
Citation
The following article appeared in Hershkowitz, N., Ding, J., Breun, R.A., Chen, R.T.S., Meyer, J., & Quick, A.K. (1996). Does high density-low pressure etching depend on the type of plasma source?. In 37th Annual Meeting of the Division of Plasma Physics of the American Physical Society, 6-10 Nov. 1995, 3 (5), 2197-202. and may be found at http://link.aip.org/link/?php/3/2197
Date
1996
Part of
http://www.aip.org; http://pop.aip.org
Description
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
Permanent link
http://digital.library.wisc.edu/1793/8700 
Export
Export to RefWorks 
‚Äč

Part of

Show full item record

Search and browse




About MINDS@UW

Deposit materials

  1. Register to deposit in MINDS@UW
  2. Need deposit privileges? Contact us.
  3. Already registered? Have deposit privileges? Deposit materials.