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Alfven ion-ion hybrid wave heating in the Phaedrus-T tokamak

Intrator, Thomas P.; Probert, Paul H.; Vukovic, Mirko; Wukitch, Stephen J.; Elfimov, Artur G.; Durst, Roger D.; Breun, Robert A.; Brouchous, David A.; Diebold, Daniel A.; Doczy, Mark; Fonck, Raymond J.; Hershkowitz, Noah; Kishinevsky, Misha; Litwin, Christof; Majeski, Richard P.; Nonn, Paul D.; Winz, Gregory R. (American Institute of Physics; 1996)
Alfven wave current drive in the Phaedrus-T tokamak

Intrator, Thomas P.; Probert, Paul H.; Wukitch, Stephen J.; Vukovic, Mirko; Brouchous, David A.; Diebold, Daniel A.; Breun, Robert A.; Doczy, Mark; Edgel, Dana; Elfimov, Artur G.; Hershkowitz, Noah; Kishinevsky, Misha; Litwin, Christof; Moroz, Paul; Nonn, Paul D.; Winz, Gregory R. (1995)
Analysis of loop voltage evolution in current drive experiments in the Phaedrus-T tokamak

Litwin, Christof; Hershkowitz, Noah; Wukitch, Stephen J.; Intrator, Thomas P.; Vukovic, Mirko; Brouchous, David A.; Breun, Robert A.; Harper, Michael (American Institute of Physics; 1995)
Aperture Effects on Charged-Particles in a Magnetic-Field

Wang, En Yao; Li, W.Q.; Lam, Shu Wai; Hershkowitz, Noah (American Institute of Physics; 1991)
Azimuthally symmetric pseudosurface and helicon wave propagation in an inductively coupled plasma at low magnetic field

Lho, Taihyeop; Hershkowitz, Noah; Miller, John R.; Steer, Warwick R.; Kim, Gon-Ho (American Institute of Physics Inc., Woodbury, NY, USA; 1998)
Detection of Secondary Electrons in a Multidipole Plasma

Hershkowitz, Noah; Goettsch, Randy L.; Chan, Chung; Hendricks, Kyle; Carpenter, Raymon T. (American Institute of Physics; 1982)
Diagnostics for plasma processing (etching plasmas)

Hershkowitz, Noah; Breun, Robert A. (American Institute of Physics; 1997)
Does high density-low pressure etching depend on the type of plasma source?

Breun, Robert A.; Quick, Anthony K.; Meyer, John; Chen, Robert Tseng Shiung; Hershkowitz, Noah; Ding, Ji (American Institute of Physics; 1996)
Double-layer-relevant laboratory results

Diebold, Daniel A.; Forest, Chris Eliot; Hershkowitz, Noah; Hsieh, Man-Kam; Intrator, Thomas P.; Kaufman, D.; Kim, Gon-Ho; Lee, Sang Geun; Menard, Jonathan E. (Publ by IEEE, Piscataway, NJ, USA; 1992)
Effect of collisions on ion dynamics in electron-cyclotron-resonance plasmas

Hershkowitz, Noah; Woods, R. Claude; Hussein, Makarem A.; Emmert, Gilbert A. (1992)
An improved capacitive divider probe for plasma potential measurements in the Phaedrus tokamak

Wang, En Yao; Diebold, Daniel A.; Nonn, Paul D.; Pew, James; Li, W.Q.; Probert, Paul H.; Breun, Robert A.; Majeski, Richard P.; Yan, Shiluo; Hershkowitz, Noah (1991)
Magnetic-field-enhanced rf argon plasma for ionized sputtering of copper

Wang, Weitung; Foster, John; Wendt, Amy E.; Booske, John H.; Onuoha, Tina; Sandstrom, Perry W.; Liu, Henley L.; Gearhart, Steven S.; Hershkowitz, Noah (American Institute of Physics; 1997)
Measurements on rotating ion cyclotron range of frequencies induced particle fluxes in axisymmetric mirror plasmas

Hatakeyama, Rikizo; Hershkowitz, Noah; Majeski, Richard P.; Wen, Y.J.; Brouchous, David A.; Probert, Paul H.; Breun, Robert A.; Roberts, D.; Vukovic, Mirko; Tanaka, Tak (American Institute of Physics; 1997)
Multiple Valued Floating Potentials of Langmuir Probes

Nam, Cheoi-Hee; Hershkowitz, Noah; Cho, Moo-Hyun; Intrator, Thomas P.; Diebold, Daniel A. (American Institute of Physics; 1988)
A novel electro-optical probe to diagnose plasma uniformity

Sarfaty, Moshe; Harper, Michael; Hershkowitz, Noah (American Institute of Physics; 1998)
Particle and Power Balances of Hot-Filament Discharge Plasmas in a Multidipole Device

Cho, Moo-Hyun; Hershkowitz, Noah; Intrator, Thomas P. (American Institute of Physics; 1990)
Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing

Friedmann, James B.; Shohet, J. Leon; Mau, Robert; Hershkowitz, Noah; Bisgaard, Soren; Ma, Shawming; McVittie, James P. (IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC; 1997)
Presheath environment in weakly ionized single and multispecies plasmas

Hershkowitz, Noah; Ko, Eunsuk; Wang, Xu; Hala, Ahmed M.A. (Institute of Electrical and Electronics Engineers Inc., Piscataway, NJ 08855-1331, United States; 2005)
Role of plasma-aided manufacturing in semiconductor fabrication

Hershkowitz, Noah (IEEE, Piscataway, NJ, USA; 1998)
Secondary-Electron Emission-Capacitive Probes for Plasma Potential Measurements in Plasmas with Hot-Electrons

Wang, En Yao; Hershkowitz, Noah; Diebold, Daniel A.; Intrator, Thomas P.; Majeski, Richard P.; Persing, Harold Michael; Severn, Gregory; Nelson, Brian A.; Wen, Y.J. (American Institute of Physics; 1987)

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