Browsing by Author "Wendt, Amy E."
Now showing items 13-15 of 15
-
An rf sustained argon and copper plasma for ionized physical vapor deposition of copper
Wang, Weitung; Foster, John; Snodgrass, Thomas G.; Wendt, Amy E.; Booske, John H. (American Institute of Physics Inc, 1999) -
Sheath thickness evaluation for collisionless or weakly collisional bounded plasmas
Wang, Shiang-Bau; Wendt, Amy E. (Institute of Electrical and Electronics Engineers Inc., Piscataway, NJ, USA, 1999) -
Striations in a radio frequency planar inductively coupled plasma
Stittsworth, Jessica A.; Wendt, Amy E. (IEEE, Piscataway, NJ, USA, 1996)