Browsing by Author "Wendt, Amy E."
Now showing items 1-15 of 15
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Absolute densities of long lived species in an ionized physical vapor deposition copper-argon plasma
Andrew, Yasmin; Abraham, Ion C.; Booske, John H.; Lu, Zhi-Cherng; Wendt, Amy E. (American Institute of Physics Inc, 2000) -
Control of ion energy distribution at substrates during plasma processing
Wang, Shiang-Bau; Wendt, Amy E. (American Institute of Physics, 2000) -
Electron heating by sheaths in radio frequency discharges
Wendt, Amy E.; Hitchon, William Nicholas Guy (1992) -
Electron-density and energy distributions in a planar inductively coupled discharge
Mahoney, Leonard J.; Wendt, Amy E.; Barrios, Ernesto; Richards, Carolyn J.; Shohet, J. Leon (1994) -
Gridless ionized metal flux fraction measurement tool for use in ionized physical vapor deposition studies
Snodgrass, Thomas G.; Booske, John H.; Wang, Weitung; Wendt, Amy E.; Shohet, J. Leon (American Institute of Physics Inc, 1999) -
Ion-cyclotron-resonance mass spectrometry with a microwave plasma source
Friedmann, James B.; Shohet, J. Leon; Wendt, Amy E. (1991) -
Magnetic-field-enhanced rf argon plasma for ionized sputtering of copper
Wang, Weitung; Foster, John; Wendt, Amy E.; Booske, John H.; Onuoha, Tina; Sandstrom, Perry W.; Liu, Henley L.; Gearhart, Steven S.; Hershkowitz, Noah (American Institute of Physics, 1997) -
Measurements of electromagnetic fields in a planar radio-frequency inductively coupled plasma source
Meyer, J.A.; Wendt, Amy E. (1995) -
Mechanisms for polycrystalline silicon defect passivation by hydrogenation in an electron cyclotron resonance plasma
Cielaszyk, Eric S.; Kirmse, Karen H.R.; Stewart, R.A.; Wendt, Amy E. (1995) -
Nonlocal electron kinetics in a low-pressure inductively coupled radio-frequency discharge
Kolobov, Vladimir I.; Beale, Daniel Frederick; Mahoney, Leonard J.; Wendt, Amy E. (1994) -
Passive external radio frequency filter for Langmuir probes
Wendt, Amy E. (American Institute of Physics, 2001) -
Plasma properties determined with induction loop probes in a planar inductively coupled plasma source
Meyer, J.A.; Mau, Robert; Wendt, Amy E. (American Institute of Physics, 1996) -
An rf sustained argon and copper plasma for ionized physical vapor deposition of copper
Wang, Weitung; Foster, John; Snodgrass, Thomas G.; Wendt, Amy E.; Booske, John H. (American Institute of Physics Inc, 1999) -
Sheath thickness evaluation for collisionless or weakly collisional bounded plasmas
Wang, Shiang-Bau; Wendt, Amy E. (Institute of Electrical and Electronics Engineers Inc., Piscataway, NJ, USA, 1999) -
Striations in a radio frequency planar inductively coupled plasma
Stittsworth, Jessica A.; Wendt, Amy E. (IEEE, Piscataway, NJ, USA, 1996)