Browsing by Author "Shohet, J. Leon"
Now showing items 18-30 of 30
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Photoemission and conduction currents in vacuum ultraviolet irradiated aluminum oxide
Lauer, Jason L.; Shohet, J. Leon; Cismaru, Cristian; Hansen, Roger W.; Foo, Mei Yuin; Henn, Timothy James (American Institute of Physics, 2002) -
Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher
Cismaru, Cristian; Shohet, J. Leon (American Institute of Physics Inc, 1999) -
Plasma-aided manufacturing
Shohet, J. Leon (1991) -
Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing
Friedmann, James B.; Shohet, J. Leon; Mau, Robert; Hershkowitz, Noah; Bisgaard, Soren; Ma, Shawming; McVittie, James P. (IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 1997) -
Reduced adhesion of human blood platelets to polyethylene tubing by microplasma surface modification
Lauer, Jason L.; Shohet, J. Leon; Alameldeen, Ralph M.; Pratoomtong, Chidchanok; Murugesan, Ravi; Esnault, Stephane; Malter, James S.; von Andrian, Ulrich H.; Bathke, Richard D.; Shohet, Stephen B. (American Institute of Physics Inc., Melville, NY 11747-4502, United States, 2004) -
Relationship between the charging damage of test structures and the deposited charge on unpatterned wafers exposed to an electron cyclotron resonance plasma
Cismaru, Cristian; Shohet, J. Leon; Nauka, Krysztof; Friedmann, James B. (American Institute of Physics, 1998) -
The sine-Gordon equation in reversed-field pinch experiments
Shohet, J. Leon; Barmish, B. Ross; Ebraheem, Hameed K.; Scott, Alwyn C. (American Institute of Physics Inc., Melville, United States, 2004) -
A statistical analysis of copper bottom coverage of high-aspect-ratio features using ionized physical vapor deposition
Snodgrass, Thomas G.; Shohet, J. Leon (Institute of Electrical and Electronics Engineers Inc, 2002) -
Surface potential measurements of vacuum ultraviolet irradiated Al2O3, Si3N4, and SiO2
Lauer, Jason L.; Shohet, J. Leon (Institute of Electrical and Electronics Engineers Inc., Piscataway, NJ 08855-1331, United States, 2005) -
Synchrotron radiation-induced surface-conductivity of SiO2 for modification of plasma charging
Cismaru, Cristian; Shohet, J. Leon; McVittie, James P. (American Institute of Physics, 2000) -
Thin-oxide charging damage to microelectronic test structures in an electron-cyclotron-resonance plasma
Friedmann, James B.; Shohet, J. Leon; McVittie, James P.; Ma, Shawming (American Institute of Physics, 1995) -
VUV Photoemission Spectroscopy Characteristics of Graphene on SiO2
Morner, Cazimir (2011-05-15)The characterization of the photoemission properties of a graphene monolayer deposited on silicon dioxide under vacuum ultraviolet radiation is determined. Within the range of photon energies between 8 and 20eV, graphene ... -
X-rays in electron-cyclotron-resonance processing plasmas
Castagna, Timothy Joseph; Shohet, J. Leon; Denton, Denice D.; Hershkowitz, Noah (1992)