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The effects of plasma exposure on the time-dependent dielectric breakdown of low-k porous organosilicate glass

Nichols, Michael (May 15, 2011)
Effects of plasma parameters on viscosity

Dahi, Hossein; Talmadge, Joseph N.; Shohet, J. Leon (IEEE, Piscataway, NJ, USA; 1998)
Electron-density and energy distributions in a planar inductively coupled discharge

Mahoney, Leonard J.; Wendt, Amy E.; Barrios, Ernesto; Richards, Carolyn J.; Shohet, J. Leon (1994)
Engineering research center for plasma-aided manufacturing

Shohet, J. Leon (1993)
Gridless ionized metal flux fraction measurement tool for use in ionized physical vapor deposition studies

Snodgrass, Thomas G.; Booske, John H.; Wang, Weitung; Wendt, Amy E.; Shohet, J. Leon (American Institute of Physics Inc; 1999)
Helically symmetric stellarator (HSX)

Almagri, Abdulgader F.; Anderson, David T.; Anderson, F. Simon B.; Probert, Paul H.; Shohet, J. Leon; Talmadge, Joseph N. (IEEE, Piscataway, NJ, USA; 1999)
In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation

Cismaru, Cristian; Shohet, J. Leon (American Institute of Physics; 2000)
An investigation of the effects of iron in p+n silicon diodes for simulated plasma source ion implantation studies

Brown, Kelly M.; Shohet, J. Leon; Booske, John H.; Gearhart, Steven S.; Liu, Henley L.; Snodgrass, Thomas G.; Speth, Robert R. (IEEE; 1999)
Ion-cyclotron-resonance mass spectrometry with a microwave plasma source

Friedmann, James B.; Shohet, J. Leon; Wendt, Amy E. (1991)
Low-energy separation by implantation of oxygen structures via plasma source ion implantation

Goeckner, Matthew J.; Turner, J.E.; Dallmann, Douglas Alan; Kruger, James B.; Shenai, Krishna; Speth, Robert R.; Booske, John H.; Rissman, Paul; Meyyappan, Nara; Lee, S.; Perez-Albuerne, Evelio A.; Zhang, L.; Shohet, J. Leon (1994)
Monte Carlo simulation of the effects of vacuum-ultraviolet radiation on dielectric materials

Upadhyaya, Ganesh Shrinivasa; Shohet, J. Leon; Lauer, Jason L. (American Institute of Physics; 2005)
Negative biasing experiment to test numerical calculations based on a neoclassical L-H transition model in stellarators

Thogersen, Erik N.; Shohet, J. Leon (IEEE, Piscataway, NJ, USA; 1996)
ONE-DIMENSIONAL MODELING OF TRANSPORT IN SMALL STELLARATORS

Mertens, K.J.S.; Hitchon, William Nicholas Guy; Anderson, David T.; Shohet, J. Leon (1988)
Photoemission and conduction currents in vacuum ultraviolet irradiated aluminum oxide

Lauer, Jason L.; Shohet, J. Leon; Cismaru, Cristian; Hansen, Roger W.; Foo, Mei Yuin; Henn, Timothy James (American Institute of Physics; 2002)
Plasma-aided manufacturing

Shohet, J. Leon (1991)
Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing

Friedmann, James B.; Shohet, J. Leon; Mau, Robert; Hershkowitz, Noah; Bisgaard, Soren; Ma, Shawming; McVittie, James P. (IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC; 1997)
Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher

Cismaru, Cristian; Shohet, J. Leon (American Institute of Physics Inc; 1999)
Reduced adhesion of human blood platelets to polyethylene tubing by microplasma surface modification

Lauer, Jason L.; Shohet, J. Leon; Alameldeen, Ralph M.; Pratoomtong, Chidchanok; Murugesan, Ravi; Esnault, Stephane; Malter, James S.; von Andrian, Ulrich H.; Bathke, Richard D.; Shohet, Stephen B. (American Institute of Physics Inc., Melville, NY 11747-4502, United States; 2004)
Relationship between the charging damage of test structures and the deposited charge on unpatterned wafers exposed to an electron cyclotron resonance plasma

Cismaru, Cristian; Shohet, J. Leon; Nauka, Krysztof; Friedmann, James B. (American Institute of Physics; 1998)
The sine-Gordon equation in reversed-field pinch experiments

Shohet, J. Leon; Barmish, B. Ross; Ebraheem, Hameed K.; Scott, Alwyn C. (American Institute of Physics Inc., Melville, United States; 2004)

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