Browsing by Author "Hershkowitz, Noah"
Now showing items 19-28 of 28
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Role of plasma-aided manufacturing in semiconductor fabrication
Hershkowitz, Noah (IEEE, Piscataway, NJ, USA, 1998) -
Secondary-Electron Emission-Capacitive Probes for Plasma Potential Measurements in Plasmas with Hot-Electrons
Wang, En Yao; Hershkowitz, Noah; Diebold, Daniel A.; Intrator, Thomas P.; Majeski, Richard P.; Persing, Harold Michael; Severn, Gregory; Nelson, Brian A.; Wen, Y.J. (American Institute of Physics, 1987) -
Sheaths: More complicated than you think
Hershkowitz, Noah (American Institute of Physics, 2005) -
Simple way to determine the edge of an electron-free sheath with an emissive probe
Wang, Xu; Hershkowitz, Noah (American Institute of Physics, 2006) -
Steady-State Ion Pumping of a Potential Dip Near an Electron Collecting Anode
Forest, Cary B; Hershkowitz, Noah (American Institute of Physics, 1986) -
Symmetric rate model for fluorocarbon plasma etching of SiO2
Ding, Ji; Hershkowitz, Noah (American Institute of Physics, 1996) -
Use of emissive probes in high pressure plasma
Yan, Shiluo; Kamal, Husain; Amundson, Jay; Hershkowitz, Noah (American Inst of Physics, Woodbury, NY, USA, 1996) -
The Virtual Cathode as a Transient Double Sheath
Intrator, Thomas P.; Cho, Moo-Hyun; Wang, En Yao; Hershkowitz, Noah; Diebold, Daniel A.; DeKock, James R. (American Institute of Physics, 1988) -
Whistler-mode electron cyclotron emission from the Phaedrus-B end cell
Cui, Binsheng; Probert, Paul H.; Brooker, Peter D.; Nonn, Paul D.; Keil, Douglas L.; Hershkowitz, Noah; Majeski, Richard P.; Breun, Robert A.; Ellis, Richard F. (1989) -
X-rays in electron-cyclotron-resonance processing plasmas
Castagna, Timothy Joseph; Shohet, J. Leon; Denton, Denice D.; Hershkowitz, Noah (1992)