Browsing by Author "Hershkowitz, Noah"
Now showing items 6-25 of 28
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Detection of Secondary Electrons in a Multidipole Plasma
Hershkowitz, Noah; Goettsch, Randy L.; Chan, Chung; Hendricks, Kyle; Carpenter, Raymon T. (American Institute of Physics, 1982) -
Diagnostics for plasma processing (etching plasmas)
Hershkowitz, Noah; Breun, Robert A. (American Institute of Physics, 1997) -
Does high density-low pressure etching depend on the type of plasma source?
Breun, Robert A.; Quick, Anthony K.; Meyer, John; Chen, Robert Tseng Shiung; Hershkowitz, Noah; Ding, Ji (American Institute of Physics, 1996) -
Double-layer-relevant laboratory results
Diebold, Daniel A.; Forest, Chris Eliot; Hershkowitz, Noah; Hsieh, Man-Kam; Intrator, Thomas P.; Kaufman, D.; Kim, Gon-Ho; Lee, Sang Geun; Menard, Jonathan E. (Publ by IEEE, Piscataway, NJ, USA, 1992) -
Effect of collisions on ion dynamics in electron-cyclotron-resonance plasmas
Hershkowitz, Noah; Woods, R. Claude; Hussein, Makarem A.; Emmert, Gilbert A. (1992) -
An improved capacitive divider probe for plasma potential measurements in the Phaedrus tokamak
Wang, En Yao; Diebold, Daniel A.; Nonn, Paul D.; Pew, James; Li, W.Q.; Probert, Paul H.; Breun, Robert A.; Majeski, Richard P.; Yan, Shiluo; Hershkowitz, Noah (1991) -
Magnetic-field-enhanced rf argon plasma for ionized sputtering of copper
Wang, Weitung; Foster, John; Wendt, Amy E.; Booske, John H.; Onuoha, Tina; Sandstrom, Perry W.; Liu, Henley L.; Gearhart, Steven S.; Hershkowitz, Noah (American Institute of Physics, 1997) -
Measurements on rotating ion cyclotron range of frequencies induced particle fluxes in axisymmetric mirror plasmas
Hatakeyama, Rikizo; Hershkowitz, Noah; Majeski, Richard P.; Wen, Y.J.; Brouchous, David A.; Probert, Paul H.; Breun, Robert A.; Roberts, D.; Vukovic, Mirko; Tanaka, Tak (American Institute of Physics, 1997) -
Multiple Valued Floating Potentials of Langmuir Probes
Nam, Cheoi-Hee; Hershkowitz, Noah; Cho, Moo-Hyun; Intrator, Thomas P.; Diebold, Daniel A. (American Institute of Physics, 1988) -
A novel electro-optical probe to diagnose plasma uniformity
Sarfaty, Moshe; Harper, Michael; Hershkowitz, Noah (American Institute of Physics, 1998) -
Particle and Power Balances of Hot-Filament Discharge Plasmas in a Multidipole Device
Cho, Moo-Hyun; Hershkowitz, Noah; Intrator, Thomas P. (American Institute of Physics, 1990) -
Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing
Friedmann, James B.; Shohet, J. Leon; Mau, Robert; Hershkowitz, Noah; Bisgaard, Soren; Ma, Shawming; McVittie, James P. (IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 1997) -
Presheath environment in weakly ionized single and multispecies plasmas
Hershkowitz, Noah; Ko, Eunsuk; Wang, Xu; Hala, Ahmed M.A. (Institute of Electrical and Electronics Engineers Inc., Piscataway, NJ 08855-1331, United States, 2005) -
Role of plasma-aided manufacturing in semiconductor fabrication
Hershkowitz, Noah (IEEE, Piscataway, NJ, USA, 1998) -
Secondary-Electron Emission-Capacitive Probes for Plasma Potential Measurements in Plasmas with Hot-Electrons
Wang, En Yao; Hershkowitz, Noah; Diebold, Daniel A.; Intrator, Thomas P.; Majeski, Richard P.; Persing, Harold Michael; Severn, Gregory; Nelson, Brian A.; Wen, Y.J. (American Institute of Physics, 1987) -
Sheaths: More complicated than you think
Hershkowitz, Noah (American Institute of Physics, 2005) -
Simple way to determine the edge of an electron-free sheath with an emissive probe
Wang, Xu; Hershkowitz, Noah (American Institute of Physics, 2006) -
Steady-State Ion Pumping of a Potential Dip Near an Electron Collecting Anode
Forest, Cary B; Hershkowitz, Noah (American Institute of Physics, 1986) -
Symmetric rate model for fluorocarbon plasma etching of SiO2
Ding, Ji; Hershkowitz, Noah (American Institute of Physics, 1996) -
Use of emissive probes in high pressure plasma
Yan, Shiluo; Kamal, Husain; Amundson, Jay; Hershkowitz, Noah (American Inst of Physics, Woodbury, NY, USA, 1996)